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| dc.contributor.author | Flores, Mauricio A. | |
| dc.contributor.author | Orellana, Walter | |
| dc.contributor.author | Menéndez-Proupin, Eduardo | |
| dc.date.accessioned | 2026-02-08T03:35:07Z | |
| dc.date.available | 2026-02-08T03:35:07Z | |
| dc.date.issued | 2018-10-17 | |
| dc.identifier.issn | 2469-9950 | |
| dc.identifier.uri | https://repositorio.uss.cl/handle/uss/20748 | |
| dc.description | Publisher Copyright: © 2018 American Physical Society. | |
| dc.description.abstract | Hybrid functionals, which mix a fraction of Hartree-Fock exchange with local or semilocal exchange, have become increasingly popular in quantum chemistry and computational materials science. Here, we assess the accuracy of the Heyd-Scuseria-Ernzerhof (HSE) hybrid functional to describe many-electron interactions and charge localization in semiconductors. We perform diffusion quantum Monte Carlo calculations to obtain the accurate ground-state spin densities of the negatively charged (SiV)- and the neutral (SiV)0 silicon-vacancy center in diamond and of the cubic silicon carbide (3C-SiC) with an extra electron. We compare our diffusion quantum Monte Carlo results with those obtained with the HSE functional and find a good agreement between the two methods for (SiV)- and (SiV)0, whereas the correct description of 3C-SiC with an extra electron crucially depends on the amount of Hartree-Fock exchange included in the functional. Also, we examine the case of the neutral Cd vacancy in CdTe, for which we assess the performance of HSE versus the many-body GW approximation for the description of the position of the defect states in the band gap. | en |
| dc.language.iso | eng | |
| dc.relation.ispartof | vol. 98 Issue: no. 15 Pages: | |
| dc.source | Physical Review B | |
| dc.title | Accuracy of the Heyd-Scuseria-Ernzerhof hybrid functional to describe many-electron interactions and charge localization in semiconductors | en |
| dc.type | Artículo | |
| dc.identifier.doi | 10.1103/PhysRevB.98.155131 | |
| dc.publisher.department | Facultad de Ingeniería y Tecnología | |
| dc.publisher.department | Facultad de Ingeniería |
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